INV ITED
P A P E R
Quantum-Dot
Optoelectronic Devices
Semiconductor dot nanostructures are being used in lasers, infrared detectors,
optical amplifiers, surface-emitting light sources, LEDs and other electronic and
optoelectronic devices.
By Pallab Bhattacharya, Fellow IEEE, and Zetian Mi
ABSTRACT | Self-organized In(Ga)As/Ga(Al)As quantum dots
have emerged as useful nanostructures that can be epitaxially
grown and incorporated in the active region of devices. The
near pyramidal dots exhibit properties arising from the three-
dimensional quantum confinement and from the coherent
built-in strain. The properties and current state-of-the-art
characteristics of quantum-dot junction lasers, intersublevel
infrared detectors, optical amplifiers, and microcavity devices
are briefly reviewed. It is evident that self-organized quantum-
dot optoelectronic devices demonstrate properties that are
sometimes unique and often surpass the characteristics of
existing devices.
KEYWORDS | Epitaxy; GaAs; quantum dots; semiconductor
lasers
I . INTRODUCTION
Zero-dimensional quantum confined semiconductor het-
erostructures have been investigated theoretically and
experimentally for some time [1]–[3]. It is only recently
that nearly defect-free quantum dots, whose structural,
electronic, and optical properties can be measured and
with which devices can be fabricated reliably and
reproducibly, have been experimentally realized. Three-
dimensional quantum confinement ideally gives rise to
complete localization of electrons and holes and a
discrete spectrum with �-function-like density of states.
These in turn lead to high material and differential gain,
high-temperature stability of devices, and higher defect
and radiation tolerance. Although many of the predicted
properties were experimentally verified with quantum
dots realized by controlled etching of epitaxially grown
quantum wells, such quantum dots were not suitable for
the fabrication of most optoelectronic devices due to the
high density of surface states created during etching.
Fortunately, advances in mismatched or strained-layer
epitaxy with III-V compound semiconductors led to the
elucidation of growth conditions under which defect-free
islands were formed [4]–[8]. By virtue of their size and
shape, these self-organized or self-assembled islands have
become the material of choice for the realization of a
host of optoelectronic devices. This paper relates the
progress made with III-V based In(Ga)As/Ga(Al)As and
InAs/InAlAs self-organized quantum dots. Great strides
have also been made with nitride-based self-organized
quantum dots, as described in one of the following papers
in this special issue, and with quantum dots synthesized
by other techniques. An example is II-VI quantum dots,
such as CdSe, CdS, etc. These developments are not
described here.
Epitaxial growth of self-organized quantum dots has
been extensively investigated in In(Ga, Al)As/Ga(Al)As
material systems [4]–[12]. Quantum-dot formation occurs
during the 2-D–3-D growth mode transition in highly
strained epitaxial growth [7]–[9]. Studies on InGaAs/GaAs
quantum dots confirm that the three-dimensional islands
are coherently strained and defect-free [7]–[9]. Therefore,
self-organized quantum dots are expected to exhibit
superior characteristics, compared to etched quantum
dots [13]. Self-organized growth also offers an unprece-
dented control over the structural, electronic, and optical
properties of quantum-dot layers. The dot size, density,
and composition can be precisely controlled by varying the
growth conditions and the amount of materials deposited.
The emission wavelengths of In(Ga, Al)As/Ga(Al)As
quantum dots can be continuously varied from the visible
Manuscript received October 27, 2006; revised April 9, 2007. This work was
supported in part by the U.S. Army Research Office, in part by the Defense Advanced
Research Projects Agency (DARPA), and in part by the National Science Foundation.
The authors are with Solid State Electronics Laboratory, Department of Electrical
Engineering and Computer Science, University of Michigan, Ann Arbor, MI 48109-2122
USA (e-mail: pkb@eecs.umich.edu).
Digital Object Identifier: 10.1109/JPROC.2007.900897
Vol. 95, No. 9, September 2007 | Proceedings of the IEEE 17230018-9219/$25.00 �2007 IEEE
to 1.55 �m [10]–[12]. For example, visible luminescence
can be obtained from InAlAs quantum dots embedded in
AlGaAs barrier layers [10], and InAs quantum dots placed
in an InGaAs quantum well can emit light at 1.3 and longer
wavelengths [12], which are important for fiber optical
communications. Additionally, the dot density can be well
controlled from 1.0 � 108 cm�2 to 1.0� 1011 cm�2 [14],
and a high degree of dot size uniformity can be achieved by
utilizing strain patterning techniques [11].
Since the first demonstration of quantum-dot laser
operation at cryogenic temperatures [15], rapid progress
has been made in quantum-dot device development.
Room-temperature quantum-dot edge-emitting lasers, first
demonstrated almost a decade ago [16]–[19], now match
or surpass quantum-well lasers in performance. This
finding was quickly followed by the demonstration of
quantum-dot vertical cavity surface-emitting lasers
(VCSELs) [20]–[24]. Large electrooptic coefficients have
been measured in the dots [25], [26]. New devices such as
the quantum-dot intersublevel photodetector (QDIP)
[27]–[31], which take advantage of the possibility of
normal incidence operation, have been conceived and
demonstrated. QDIPs have now demonstrated high-
temperature (200 K–300 K) operation, large responsivity
(�1 A/W), and high detectivity ðD� � 1011 cmpHz/WÞ.
More recently, terahertz detection at 300 K has been
demonstrated with QDIPs. Similarly, surface-emitting,
quantum-dot intersubband light sources have been
demonstrated [32], [33]. Self-organized quantum dots
also offer more exciting possibilities. Semiconductor
optical amplifiers with quantum-dot active regions take
advantage of the wide gain spectrum due to size inho-
mogeneity of self-organized dots. These devices have
demonstrated ultrafast nonlinear gain response (�few
picoseconds), ultrawide gain spectra, of the order of a few
hundred nanometers, low noise figure, and high satura-
tion power [34]. The observation of cavity quantum
electrodynamics phenomena in semiconductor systems is
made possible by a single quantum dot emitting in a
single-mode optical cavity with a high quality factor, such
as a single-defect microcavity in a photonic crystal. These
devices have been fabricated and characterized for the
first time [35]. Rapid progress is also being made in the
development of lasers with nitride-based, self-organized
quantum dots [36]–[39]. All these exciting developments
are described in more detail in subsequent papers in this
special issue.
II . SELF-ORGANIZED EPITAXY OF
In(Ga)As/GaAs QUANTUM DOTS
The realization of a high density of uniform quantum dots
has been elusive. The most direct approach, with epitaxial
growth of a quantum well followed by controlled etching,
provides the requisite size and uniformity. Unfortunately,
surface defects produced by the etching process and
interface states introduced during subsequent regrowth
(to complete the laser heterostructure) reduce the radiative
efficiency to levels that are not suitable for lasers [40], [41].
Self-organized quantum dots have been proven to be the
structures that best approach the desired properties [5], [7],
[42], and almost all groups actively pursuing quantum-dot
device development are utilizing self-organized growth.
The use of strain to produce self-organized quantum-dot
structures has now become a well-accepted approach and is
widely used in III-V semiconductors and other material
systems. Advances in epitaxial growth, particularly better
size control [43]–[46] and better material quality (as
reflected by optical characterization) [47]–[56], have been
essential for the application of quantum dots to lasers,
detectors, and other optoelectronic devices.
It has been shown that highly lattice-mismatched
Ga(In)As epitaxially grows on GaAs in the Stranski–
Krastanov growth mode [56], where self-organized islands
are formed after a few monolayers of layer-by-layer
growth. The latter is usually termed the wetting layer.
From reflection high-energy electron diffraction (RHEED)
measurements during molecular beam epitaxial (MBE)
growth of InGaAs on GaAs and from energy minimization
considerations in a unit cell of the growing layer, it was
shown for the first time that for a misfit f 9 1:8%, the
island mode of growth is preferred [5]. For typical growth
parameters used in MBE or metal–organic vapor phase
epitaxy (MOVPE), an array of near-pyramidal islands of
lateral size 10–40 nm and heights 5–8 nm are formed.
Elastic relaxation on the facet edges, renormalization of
the surface energy of the facets, and interaction between
neighboring islands via the substrate are the driving forces
for self-organized growth. There are considerable strain
fields within the dots, in the substrate underneath, and in
the overlayer, if the latter is grown. In situ atomic force
microscope (AFM) studies [46] during the growth of InAs
on GaAs have given valuable insight into the evolution of
the size distribution between dots, as growth proceeds, and
the tendency for eventual size equalization. Careful studies
of growth in the InAs-GaAs system [7]–[9] have also shown
that a relatively narrow range of deposition parameters
exists, where the islands are small (�10 nm), have similar
size and shape, and form dense arrays. Interaction of the
islands via the substrate also makes their lateral ordering
favorable [57], [59]. By virtue of their size and shape, the
self-organized islands best approach the desired properties
of zero-dimensional quantum dots. An AFM image of an
array of InAs/GaAs dots grown by MBE at 500 �C at a rate
of 0.1 monolayers/s is shown in Fig. 1(a). From this image
the dot density is estimated to be 5 � 1010 cm�2. The
cross-sectional transmission electron microscope (XTEM)
image of a single dot is shown in Fig. 1(b). The pyramids
have a base diagonal of 20 nm and height of 7 nm.
If a layer of In(Ga)As dots is covered with a thin layer
of GaAs and another In(Ga)As growth cycle is initiated,
the dots in the second layer are vertically aligned to the
Bhattacharya and Mi: Quantum-Dot Optoelectronic Devices
1724 Proceedings of the IEEE | Vol. 95, No. 9, September 2007
dots in the first layer and this trend continues, resulting in
a three-dimensional array of vertically aligned and
electronically coupled dots [57], [59]. Multiple layer
quantum dots (MLQDs) are very useful for laser applica-
tions. The optimum growth conditions for multidot layers
have been described in detail [54], [55], [57]. Usually, a
smaller thickness of InGaAs needs to be deposited for
subsequent quantum-dot layers. This is because the
wetting layer thickness progressively decreases. A useful
feature of multidot layer growth is the reduction in the
photoluminescence (PL) spectral linewidth. In fact, highly
uniform dot ensembles, as shown in Fig. 2(a), can be
realized with a dot bilayer in which a layer of vertically
coupled active dots follows an underlying layer of
stressor dots, shown in the XTEM image of Fig. 2(b).
Room-temperature PL spectra of the bilayer is shown in
Fig. 2(c). Temperature and excitation-dependent mea-
surements and analysis of the data have confirmed that
the linewdith of 17.5 meV at 300 K is limited by phonon
scattering and there is very little evidence of size non-
uniformity. Similar results have been reported by other
groups [12] and provide evidence of high-quality defect-
free quantum dots, which are needed for the fabrication
of devices.
The PL spectrum of the dots shown in Fig. 2(c)
exhibits a peak, corresponding to ground state transitions,
at 1.4 �m. By changing the dot size and engineering the
heterostructure, emission wavelengths ranging from 0.6
to 1.5 �m can be achieved in In(Ga)As/Ga(Al)As quantum
dots. This provides unprecedented flexibility in device
design and requirements. With heterostructures made of
other compounds, access to shorter and longer wave-
lengths is made possible.
Fig. 1. (a) Atomic force microscopy image of an InAs quantum-dot layer
on GaAs. (b) Cross-sectional transmission spectroscopy
image of a single quantum dot grown on GaAs.
Fig. 2. Characteristics of bilayer quantum-dot heterostructures.
(a) Atomic force microscopy image of the active quantum-dot layer.
(b) Cross-sectional transmission electron microcopy image.
(c) PL spectrum measured at 300 K.
Bhattacharya and Mi: Quantum-Dot Optoelectronic Devices
Vol. 95, No. 9, September 2007 | Proceedings of the IEEE 1725
III . ELECTRON AND HOLE STATES AND
CARRIER SCATTERING
The large built-in strain in self-organized quantum dots
causes a large change in the effective bandgap of the
quantum dots. In InAs quantum dots on GaAs substrates,
the ground state transition energy is �1.05 eV even
though the bandgap of InAs is 0.4 eV. This large strain-
driven effect suggests that the electronic spectra of the
structure cannot be calculated accurately by a simple
effective mass approach. The most accurate method, as
far as effective mass and envelope function based
techniques are concerned, to determine the electronic
levels in self-organized quantum dots utilizes the 8-band
k p formulation [60]–[62]. Pseudopotential approaches
have also been developed to calculate the electronic
structure of dots without using any effective mass or
envelope function approximations. By a detailed compar-
ison of the 8-band k p and empirical pseudopotential
approaches, Wang et al. have found a generally good
agreement between the two methods in the calculation of
the electronic structures of InAs/GaAs self-organized
quantum dots. In the presence of strain, the Hamiltonian
has the form
Ht ¼ H0 þ Hstr (1)
where H0 is the kinetic energy term and Hstr is the strain
term determined by the valence force field model [62].
The spin-orbit dependent deformation potential is gener-
ally neglected. Using a finite difference method, the
equation is solved numerically, with the distance between
two grid points chosen to be equal to the lattice constant of
GaAs ða ¼ 5:6533 A�Þ [61]. For pyramidal In0:4Ga0:6As
quantum dots, with a base width of 124 A˚ and a height of
64 A˚, the calculated electronic spectra are shown in Fig. 3.
These dot dimensions are close to those measured using X-
TEM. There are a number of discrete electron states. The
first excited electronic state is �60 meV higher than the
ground state. There is a considerable mixture of wetting
layer states in this state because it is less confined. In real
quantum-dot ensembles, these discrete levels are inhomo-
geneously broadened due to size variation of the dots. In
addition, level splittings can occur due to interdot
coupling, causing the formation of bands of electronic
levels around the central excited and ground state levels.
Furthermore, the excited level in each dot has a twofold
degeneracy due to the symmetry of the dot geometry. This
is in addition to the spin degeneracy.
It is evident that the separation between the bound
electron states is larger than the optical phonon energy in
the dot material (�36 meV). Therefore, optical phonon
scattering, the primary mechanism for carrier relaxation in
semiconductors, is suppressed in the quantum dots. This
constitutes a phonon bottleneck [40], [63]–[65]. On the
other hand, the separation of the bound hole states is less
than the phonon energy and, in addition, there is
considerable band-mixing. Therefore, holes thermalize
efficiently in the dots. The ground and excited states of the
dots are observed experimentally in PL, photocapacitance,
and transmission spectra. An example is the PL spectrum
shown in Fig. 2(c). Interband transition probabilities are
high only for those transitions between electron and hole
levels of the same quantum number.
Calculations have shown that both single-phonon and
multiphonon scattering processes are suppressed in
quantum dots. Electron–electron scattering is also inef-
ficient. From theoretical calculations [66]–[78] and a
large body of experimental results [65], [69]–[72], it is
now evident that electron–hole scattering is the dominant
mechanism through which hot electron relaxation takes
place in quantum dots. It may also be noted that
scattering of an electron in the dot with a carrier in the
barrier or wetting layer can occur for very high excitation
densities. The occupation of the low-lying electron states
depends strongly on electron–hole scattering and hole
Fig. 3. Conduction and valence band energy levels for an InAs/GaAs
quantum dot with base width 12.4 nm and height 6.2 nm calculated
using the 8-band k p model.
Bhattacharya and Mi: Quantum-Dot Optoelectronic Devices
1726 Proceedings of the IEEE | Vol. 95, No. 9, September 2007
occupation of the ground state. In electron–hole scatter-
ing, hot electrons in the excited states scatter with ground
state holes and transfer their energy to the holes. The
holes then lose their energy via phonons. It is important
to include self-consistent level broadening in the evalu-
ation of these rates for discrete electronic states. The
scattering processes at cryogenic and room temperatures
are depicted in Fig. 4(a) and (b), respectively. The
scattering rate is greatly dependent on the hole lifetime
�h, which allows us to relax energy conservation
restriction in the scattering rate via a broadening function
of width �E given by
�E � h=2��h: (2)
The hole lifetime has been measured to be �0.6 ps [70].
With an increase of temperature, the thermal excitation of
holes from the lowest quantum-dot levels can decrease
the rate of the electron–hole scattering process because
there are fewer holes for the electrons to recombine with.
It has been demonstrated that the temperature depen-
dence of the K-factor (which quantifies the damping limit
of the modulation bandwidth at high injection levels) of
high-speed quantum-dot lasers [73] and the temperature
dependence of the measured Auger coefficient of
In0:4Ga0:6As/GaAs quantum dots [74], are direct con-
sequences of the temperature dependence of the ground
state hole occupation, which in turn controls the rate of
electron–hole scattering.
IV. HOT-CARRIER DYNAMICS IN
QUANTUM DOTS
For lasers and intersublevel detectors, it is important to
understand the dynamics of injected carriers in the former
and photoexcited carriers in the latter. Several groups have
actively studied these aspects theoretically [75], [76] and
experimentally [76]–[79]. We have performed femtosec-
ond pump-probe differential transmission spectroscopy
(DTS) measurements on multiple quantum-dot hetero-
structures at temperatures ranging from 4 K to 300 K [65],
[70]. Data is obtained with both temporal and spectral
resolution. From these measurements we have observed
phonon bottleneck phenomena, only under weak excita-
tion conditions, due to the large energy separation of the
electron states [65]. We have directly measured the
relaxation times of electrons from higher lying wetting
layers and barrier states to the dot excited and ground
states under different excitation conditions and varying
temperatures. It is observed that, in general, electron
relaxation from the dot excited states to the ground state is
an extremely fast process, via electron–hole scattering,
with typical relaxation times
1 ps over a wide
temperature range. We have directly measured the ground
state gain recovery time in quantum-dot lasers and this
time is
1 ps. This is advantageous for optical amplif