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Ye Sun , Mogens Christensen , Simon Johnsen ,
Eryun Zhang , Anders E. C. Palmqvist , Jørgen
Low-Cost High-Performance Z
for Thermoelectric Application
Risø National Laboratory for Sustainable Energy
Rising demand for energy effi ciency and green solutions has
led to a strong global interest in thermoelectric (TE) devices.
However, TE power generation (heat to electricity) still has few
commercial applications [ 1–4 ] since no cheap, stable, non-toxic
and high-performing materials made of abundant elements
are known. [ 5 , 6 ] The effi ciency of TE materials is evaluated using
the dimensionless fi gure of merit, zT = S 2 T / ρ κ , where S is the
Seebeck coeffi cient, T is the absolute temperature, ρ is the elec-
tice thermal conductivity together with the measured PFs and
b 3
n
se
T
ey
ve
lf-
nt
re
Technical University of Denmark
Roskilde, DK-4000, Denmark
Dr. Y. Ma , Prof. A. E. C. Palmqvist
Department of Chemical and Biological Engineering
Chalmers University of Technology
Göteborg, SE-41296, Sweden
Dr. M. Sillassen , Dr. E. Zhang , Prof. J. Bøttiger
Department of Physics and iNANO
Aarhus University
Aarhus C, DK-8000, Denmark
DOI: 10.1002/adma.201104947
κ e ’s, zT was estimated to be ∼ 1.15 and ∼ 0.6 at 573 K for Zn 4 S
and ZnSb, respectively. These values are outstanding eve
under highly conservative estimations since the true κ L of the
fi lms would be much lower than the bulk values, and thus z
is higher. These thin fi lms for the fi rst time fulfi ll all the k
material requirements for commercial TE application, and ha
signifi cant potential to be used in TE sensors, coolers or se
powered micro-devices.
Three types of zinc antimonide fi lms with differe
Zn:Sb atomic ratios of (A) ∼ 50:50, (B) ∼ 54:46 and (C) ∼ 58:42 we
Dr. Y. Sun , Dr. M. Christensen , Dr. S. Johnsen ,
Prof. B. B. Iversen
Center for Materials Crystallography
Department of Chemistry and iNANO
Aarhus University
Aarhus C, DK-8000 Denmark
E-mail: bo@chem.au.dk
Dr. N. V. Nong
Fuel Cells and Solid State Chemistry Division
trical resistivity, and κ is the thermal conductivity consisting of
a contribution from the charge carrier κ e and the lattice κ L . TE
materials with zT > 1 are typically required to give a TE device
a reasonable effi ciency, but in fact for commercial applications
it is equally important that the TE material is made of cheap
and abundant elements with a cost-effective synthesis method.
Although most research concerns bulk materials for high-
power applications such as the recovery of waste heat from a car
exhaust, attractive low-power applications of thin fi lms (e.g., as
sensors) or self-powered microdevices are evident. The inherent
phonon scattering due to the nanostructure of thin fi lms can
be exploited to enhance TE properties. [ 7–11 ] Extremely high TE
fi gures of merit have been reported for superlattices, [ 12 , 13 ] yet
their complicated and expensive production makes large-scale,
widespread commercialization problematic.
The β phase of Zn 4 Sb 3 is a promising p -type TE material due
to its exceptionally low lattice thermal conductivity. [ 14 , 15 ] The
highest zT value of Zn 4 Sb 3 was reported to be 1.3 at 670 K, [ 16 ]
although later studies have shown that zT degrades signifi cantly
with repeated thermal cycling due to thermal decomposition of
© 2012 WILEY-VCH Verlag GmAdv. Mater. 2012, 24, 1693–1696
Ngo V. Nong , Yi Ma , Michael Sillassen ,
Bøttiger , and Bo B. Iversen *
inc Antimonide Thin Films
s
the structure. [ 6 ] In comparison with other high performance TE
materials working in the same temperature range, which are
predominantly tellurium based, [ 3 , 5 ] Zn 4 Sb 3 has overwhelming
advantages in commercial applications owing to the low cost,
and the relatively large abundance and low toxicity of Zn and
Sb. The ZnSb phase is also a good p -type TE material. [ 14 , 17 , 18 ]
with a large power factor (PF = S 2 / ρ ) comparable to Zn 4 Sb 3 , but
a high κ restricts zT to ∼ 0.6 at 500 K. [ 14 ] To improve practical
application of Zn 4 Sb 3 and ZnSb, numerous studies have exam-
ined the TE properties and stability of zinc antimonide bulk
materials. [ 6 , 14–19 ] However, few studies have explored the growth
and TE properties of zinc antimonide fi lms, and only impure
fi lms were obtained. [ 20 , 21 ]
The Zn-Sb binary phase diagram has attracted much atten-
tion and the stability of the different known phases has been
scrutinized. [ 6 , 22 , 23 ] Recently, a new Zn 8 Sb 7 phase was identifi ed
experimentally [ 24 ] and theoretical calculations have been used to
estimate the physical properties and stability of this phase. [ 25 ]
In the present study ZnSb fi lms as well as two completely new
meta-stable crystalline phases of zinc antimonide were directly
deposited on silica substrates by a co-sputtering method. After
post-annealing treatments at 573 K, the two new phases trans-
formed into Zn 4 Sb 3 + ZnSb and single phase Zn 4 Sb 3 fi lms,
respectively. The phase transitions of the new fi lms were con-
fi rmed directly by in situ powder X-ray diffraction (PXRD) and
further evidenced through the changes in the electrical proper-
ties. Thermoelectric characterization along the in-plane direc-
tion revealed that our Zn 4 Sb 3 and ZnSb fi lms exhibit very large
PF values, which are comparable to the best reported results
of the bulk materials, [ 14 , 15 ] but unlike the bulk materials, [ 19 , 26 ]
they also have good thermal stability up to 573 K. This implies
a remarkable application potential of these fi lms in TE power
generators and sensors. Due to surface and grain-boundary
scattering of phonons, TE nanocrystalline thin fi lms potentially
have much reduced κ compared with bulk samples, and thus
potentially much enhanced z T values. [ 27 , 28 ] We have not been
able to measure κ of the present fi lms, but using the bulk lat-
bH & Co. KGaA, Weinheim 1693wileyonlinelibrary.com
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produced by controlling the growth parameters (Figure S1). The
fi lm growth was carried out a very large number of times and
the synthesis is highly reproducible. PXRD analyses revealed
that the type A samples are single phase ZnSb fi lms ( Figure 1 a),
whereas the PXRD patterns of the type B (Figure 1 b) and type C
(Figure 1 c) samples were totally different from each other and
could not be indexed to any of the well known Zn-Sb phases:
Zn 4 Sb 3 , Zn 8 Sb 7 , ZnSb, Zn 3 Sb 2 , Zn, or Sb. This strongly sug-
gests formation of two new meta-stable crystalline phases of
zinc antimonide.
The type A samples were produced at 573 K. Formation of a
fl at and continuous fi lm was confi rmed by the top-view scan-
ning electron microscope (SEM) image presented in the inset
of Figure 1 a. The ZnSb (211) peak dominates the whole PXRD
pattern (Figure 1 a), suggesting growth of a < 211 > -textured ZnSb
fi lm. These single phase ZnSb fi lms keep their crystal structure
under an annealing treatment at 573 K, only the peak intensity
in the PXRD patterns is slightly enhanced. Growth of ZnSb fi lms
by other methods such as metalorganic chemical vapor deposi-
tion [ 29 ] or thermal evaporation [ 21 ] have been reported. However,
these studies did not provide clear PXRD patterns of the ZnSb
fi lms and/or present rational TE properties. Here, growth of
textured and single phase ZnSb fi lms by a sputtering method
was demonstrated by PXRD and energy dispersive X-ray analysis
(EDX), and their excellent TE properties will be discussed below.
patterns. In contr
C) are single phas
fi lm. The evolutio
were followed by
evolves into a mi
while phase C tra
and e.
To further prob
antimonide fi lms
perature ρ and c
annealed fi lms w
and n of the as-gr
1.9 × 10 19 cm − 3 ,
slightly changed ρ
1.5 × 10 19 cm − 3 . T
of ∼ 650 000 m Ω
than that of the an
C fi lms, the an
from 43.0 m Ω c
3.6 × 10 19 cm − 3 to
Figure 2 a–c sh
(type A) with a t
from cross-section
The TE measure
cycles, i.e. RT →
Figure 1 . XRD patterns of a) a type A sample (ZnSb), b) a type B sample and an annealed type
B sample (Zn 4 Sb 3 + ZnSb), and c) a type C sample and an annealed type C sample (Zn 4 Sb 3 ).
Top view SEM images of the corresponding samples are presented in the inset of the fi gure.
The scale bar is applied to all the SEM images in this fi gure. d) and e) In situ PXRD data from
annealing of a phase C fi lm showing the phase transformation to Zn 4 Sb 3 . The large peak at
28–29 ° stems from the graphite dome of the high temperature furnace.
is close to that of the type C fi lms (58:42),
the structure evolvement of type C fi lms to
Zn 4 Sb 3 fi lms during annealing appears to
be purely a structural transition. Zhang et al.
have reported on the growth of Zn 4 Sb 3 fi lms
by sputtering Zn and Sb targets at room
temperature ( RT ) and then annealing in Ar
atmosphere at 573–673 K. [ 20 ] The obtained
fi lms contain zinc impurities and do not have
preferred orientation according to the PXRD
ast, the present Zn 4 Sb 3 fi lms (annealed type
e and with the c -axis in the plane of the thin
n of phase transitions in type B and C fi lms
in situ PXRD, showing clearly that phase B
xture of ZnSb and Zn 4 Sb 3 (See Figure S2),
nsforms into single phase Zn 4 Sb 3 , Figure 1 d
e the phase transitions of the as-grown zinc
during the annealing process, room tem-
arrier concentration ( n ) of as-deposited and
ere measured (Table S1). The measured ρ
own ZnSb fi lms (type A) are 2.6 m Ω cm and
respectively. The annealing treatment only
and n of this ZnSb fi lm to 3.1 m Ω cm and
he as-grown type B fi lm has a high ρ value
cm, which is fi ve orders of magnitude larger
nealed type-B fi lm (4.9 m Ω cm). For the type
nealing treatment led to a decrease of ρ
m to 3.4 m Ω cm and increase of n from
2.8 × 10 20 cm − 3 .
ows the TE properties of a typical ZnSb fi lm
hickness of ∼ 450 nm, which was measured
al SEM image of the fi lm (inset of Figure 2 b).
ments were subjected to two measurement
573 K → RT → 573 K → RT . It can be seen
www.MaterialsViews.com
The type B samples were produced at
523 K, but they are not stable at T ≥ 573 K.
An annealing treatment under Ar atmos-
phere at 573 K for 2 h results in a phase
transition of the type B samples into
Zn 4 Sb 3 + ZnSb as evident from the PXRD
pattern shown in Figure 1 b, where all the
PXRD peaks of the annealed sample can
be assigned to Zn 4 Sb 3 and/or ZnSb. The
annealed type B fi lms are continuous and
have relatively smooth top surfaces, as seen
in the SEM image in the inset of Figure 1 b.
No detectable changes of the Zn:Sb atomic
ratio were observed from the as-deposited
and annealed type B fi lms.
The type C samples, which were produced
at 473 K, are also unstable at an annealing
temperature of 573 K. Their crystalline
metastable phase evolves to pure Zn 4 Sb 3 after
a 2 h annealing treatment, as seen in the
PXRD pattern in Figure 1 c. The dominating
(030) peak implies formation of a Zn 4 Sb 3
fi lm with the c -axis in the plane of the fi lm.
Since the Zn:Sb atomic ratio of Zn 4 Sb 3 (4:3)
heim Adv. Mater. 2012, 24, 1693–1696
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was subjected to three TE property measure-
ment cycles, and the annealed sample shows
a stable TE performance (Figure S3) with PF
values consistent with the results shown in
Figure 2 f.
Figure 3 shows the estimated zT versus
temperature for the ZnSb and Zn 4 Sb 3 fi lms
using κ L of the corresponding bulk mate-
rials. [ 14 – 16 ] To obtain κ , κ e was calculated
from measured values of ρ , and added to
literature values of bulk κ L . The highest
zT of the ZnSb and Zn 4 Sb 3 fi lms were
estimated to be ∼ 0.57 and 1.15 at 573 K,
respectively. These values are conservatively
estimated since the thin fi lms should have
a much reduced κ due to their small crys-
tallite sizes (about 40 nm for both Zn 4 Sb 3
and ZnSb fi lms estimated by the Scherrer
method) and thus the zT values would be
higher. The present materials fulfi ll the key
( T ), e) S ( T ), and
ge of RT to 573 K
lms are shown in
Cycle 1
Cycle 2
film
0 500 550 600
re / K
www.MaterialsViews.com
that the TE properties of the fi lm become stable after the fi rst
heating cycle (Figure 2 a–c). In general, ρ slightly decreases,
while S ( p -type conducting behavior) increases with increasing
temperature. At 573 K, the measured ρ and S values of the
ZnSb fi lm were 2.9 m Ω cm and 219 μ V K − 1 , respectively,
yielding a PF value of about 16.5 W m − 1 K − 2 , which is con-
sistent with the reported results for ZnSb single crystals. [ 30 , 31 ]
This indicates a good crystal quality of the ZnSb fi lms. Pre-
viously, the TE properties of ZnSb fi lms produced by the
MOCVD method have been reported, [ 21 ] but the S ( T ) and ρ are
not consistent with the results for ZnSb single crystals. [ 30 , 31 ] In
addition, no XRD pattern was provided to confi rm the forma-
tion of ZnSb fi lms.
Since the Zn 4 Sb 3 fi lms can be obtained by annealing type
C fi lms at 573 K for several hours, type C fi lms should par-
tially or fully evolve into Zn 4 Sb 3 fi lms during TE property
measurements. In Figure 2 d and e, ρ ( T ) and S ( T ) of a type C
Figure 2 . a) ρ ( T ), b) S ( T ), and c) PF( T ) of a type A sample (ZnSb). d) ρ
f) PF( T ) of a type C fi lm. Two measurement cycles in the temperature ran
were performed. Cross-sectional SEM images of the type A and the type C fi
the inset of b) and e), respectively.
1
2
3
4
120
160
200
240
ρ
/ m
Ω
cm
Cycle 1
Cycle 2
ZnSb filma)
b)
S
/ μ
V/
K
300 350 400 450 500 550 600
12
15
18 c)
Temperature / K
PF
/ 1
0-4
W
m
-
1 K
-
2
1
10
100
50
100
150
200
ρ
/ m
Ω
cm
Type C d)
e)
S
/ μ
V/
K
300 350 400 45
0
4
8
12 f)
Temperatu
PF
/ 1
0-4
W
m
-
1 K
-
2
© 2012 WILEY-VCH Verlag GmbH & Co. KGaA, WeinAdv. Mater. 2012, 24, 1693–1696
fi lm are shown. The fi lm thickness is about 540 nm, which
was measured from the cross-sectional SEM image presented
in the inset of Figure 2 e. No change of the fi lm thickness was
observed before and after the annealing treatment. On heating,
ρ ( T ) of the fi rst measurement cycle decreased from 37 m Ω cm
at RT to 16 m Ω cm at 460 K, and then quickly dropped to
∼ 3 m Ω cm at T > 460 K. This is attributed to the transition
from phase C to Zn 4 Sb 3 , which is in good agreement with the
in situ PXRD data with an onset at about 490 K (Figure 1 d).
The measured S (553 K) of the Zn 4 Sb 3 fi lms is about 190 μ VK − 1 ,
and they have a maximum PF value of ∼ 12 × 10 − 4 Wm − 1 K − 2 at
553 K (Figure 2 f).
It has been suggested that Zn 4 Sb 3 could be unstable at
T ≥ 523 K [ 6 , 32 ] and single-phase Zn 4 Sb 3 nanoparticles are not
stable at T ≥ 473 K. [ 33 ] However, the stable PF of our Zn 4 Sb 3
fi lm during the two measurement cycles implies a good phase
stability of Zn 4 Sb 3 at T ≤ 573 K in a low pressure inert atmos-
phere. In order to further confi rm the stability of the Zn 4 Sb 3
fi lms synthesized in this work, type C samples were annealed at
573 K for 10 h. After annealing, PXRD confi rmed that the fi lms
were single phase Zn 4 Sb 3 . Subsequently the annealed sample
Figure 3 . zT of ZnS
culated from meas
κ L . In the literature
of bulk Zn 4 Sb 3 hav
b and Zn 4 Sb 3 fi lms. In order to estimate κ , κ e was cal-
ured values of ρ , and added to literature values of bulk
two different values for the lattice thermal conductivity
e been given leading to slightly different zT curves.
requirements for commercial TE device
application: cheap elements, cheap fabrication method, high
performance and thermal stability, and they appear ideally
suited for TE devices based on thin fi lms.
Experimental Section
Zinc antimonide fi lms were deposited on polished fused silica
substrates by co-sputtering of a Zn target and a specifi cally prepared
Zn/Sb compound target. The sputtering system was equipped with two
independent magnetron sources with a target-to-substrate distance of
10 cm. The chamber base pressure was approximately 1 × 10 − 5 Pa. Argon
(purity 99.9996%) was used as sputter-gas at a fl ow rate of 10 sccm and
the Ar pressure in the chamber was fi xed at 0.6 Pa. In order to control
the thin fi lm growth, different magnetron power of 5–12 W, substrate
temperatures of 473–573 K and deposition times of 1–3 h were applied.
The post-annealing treatment of the fi lm samples was performed with
an Ar pressure of ∼ 1.0 Pa at 573 K using the vacuum chamber of the
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169
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sputtering system. The detailed growth parameters of the fi lm samples
are given in the Supporting Information.
The as-deposited and annealed samples were characterized by SEM
(Nova600 NanoLab, FEI) with EDX, PXRD (D8 Discover, Bruker AXS) in
θ –2 θ geometry with CuK α radiation, and in situ PXRD (Rigaku Smartlab,
see Supporting Information).
The in-plane Seebeck coeffi cient and electrical resistivity were
simultaneously measured from room temperature to 573 K under
He atmosphere ( ∼ 0.09 MPa, purity 99.999% with < 0.5 ppm residual
oxygen) using two different ULVAC–RIKO ZEM-3 thermoelectric
property measurement systems (instrumental error within 7%). Room
temperature Hall measurements were performed using a Quantum
Design Physical Property Measurement System.
Supporting Information
Supporting Information is available from the Wiley Online Library or
from the author.
[ 1 ] F. J. DiSalvo , Science 1999 , 285 , 703 .
[ 2 ] B. C. Sales , Science 2002 , 295 , 1248 .
[ 3 ] G. J. Snyder , E. S. Toberer , Nat. Mater. 2008 , 7 , 105 .
[ 4 ] M. S. Dresselh